Degreasing preparations for use in manufacturing processes; Abrasive compositions used in the manufacture of metal polish; Aromatic solvents for industrial and commercial use; Chemical compositions for metal plating; Chemical preparations for use in industry; Chemical slurries for polishing semiconductors; Chemical source material for the deposition of thin films upon semiconductor wafers for the manufacture of semiconductors; Chemicals for use in the biochemical and chemical industry; Chemicals used in industry; Citric acid; Citric acid for industrial purposes; Degreasing solvents for use in manufacturing processes; Detergents for use in manufacturing processes; Fire extinguishing and fire prevention compositions; Glycol; Heat transfer fluids for industrial use; Magnetic fluid for industrial purposes; Metal plating chemical compositions; Metal plating chemical compositions, namely, electrolytic acid copper solutions; Nitric acid; Phosphoric acid; Polymers and polymeric additives for use in the manufacture of industrial products, consumer and household products, sealants, and automotive fluids; Propylene glycol; Specialty chemicals, namely, chemical additives for general industrial use in the manufacture of a wide variety of goods; Sulfuric acid; Water-based electrolyte coolants for electro-chemical machining operations