Industrial surface treatment equipment, namely, high density plasma treatment systems comprised of a high frequency, high voltage pulse generator, controls, and treatment chamber and structural parts therefor; industrial surface treatment equipment in the nature of magnetically enhanced electrodes within a vacuum chamber for plasma deposition for depositing thin films; devices for industrial surface treatment in the nature of magnetically enhanced electrodes for generating high density plasma for surface treatment of substrates; vapor deposition machines for surface treatment for creating thin film material and for etching; chemical vapor deposition machines; ionized physical vapor deposition machines; high density plasma etching machines; high density plasma reactive ion etching machines; plasma thrusters for machinery; ion implantation machines