Measurement apparatus, namely, apparatus for determining the change in resistance of a material on irradiation with ultraviolet (UV) radiation and for detecting a radiation dose; scientific and technical apparatus, namely, optical windows, lenses, mirrors, prisms or reflectors of natural or synthetic quartz glass, for use in detectors for determining physical variables of electromagnetic waves, spectrometers, reflectometers, interferometers, laser cavities, installations for photolithographic laser cavities, installations for photolithographic structuring of a photoresist layer, in particular installations for photolithographic structuring of a photoresist layer in the manufacture of integrated circuits, installations for immersion lithography, installations for extreme ultraviolet lithography (EUV), in particular in installations for EUV lithography in the manufacture of integrated circuits, elements for coupling of pump light into active laser fibers, elements for coupling of laser light into passive transmission fibers, laser heads for focusing, shaping or positioning of a laser beam, in particular laser heads for focusing, shaping or positioning of a laser beam in industrial cutting and welding systems, connectors of passive laser cables, in particular for transmission of laser beams from the place of production to the place of use, vacuum chambers for modification of surfaces, in particular for vaporizing, hardening, sputtering or plasma etching of surfaces, in particular for LED manufacture, camera systems for telescopes, in particular which examine a wide wavelength range, including the near-infrared range, optics for laser fusion projects, camera systems for optical quality control or for control of positioning systems, in particular camera systems for optical quality control or for control of positioning systems which work within a wavelength range of 2000-3500 nm

Lighting apparatus, namely, lighting installations, lamps, arc lamps, germicidal burners for laboratory use, furnaces, other than for laboratory use, furnaces, other than for laboratory use, distillation apparatus not for scientific purposes, gas lamps, gas purification_ machines; Lighting systems and lighting devices for lighting systems for curing, cleaning or activating surfaces for preparing further process steps or for modifying surface structure, all the aforesaid steps in particular using ultraviolet (UV) radiation

Fused silica as a semi-worked product, other than for building, and semi-worked products made therefrom, namely, tubes, poles, plates, blocks; quartz glass bodies, namely, quartz glass and semi-finished quartz glass, namely, pipes, rods, plates, and blocks, preferably for lighting systems and lighting means for lighting systems, quarts glass vitreous silica fibers, not for textile use; Opaque quartz glass and opaque quartz glass fibers, not for textile use; Synthetic quartz glass and synthetic quartz glass fibers, not for textile use; Natural quartz glass and quartz glass fibers of natural quartz glass, not for textile use