Machines for manufacturing semiconductor substrates, hard discs, silicon discs, semiconductor wafers, photo masks, hard masks, embossing masks, quartz templates, metal templates, glass templates used in the manufacture of semiconductors, patterned media, structured masks and substrates for nanoimpring lithography; Machines used for wet chemical treatment of semiconductor substrates, hard discs, silicon discs, wafers, photo, hard and embossing masks, templates, structured masks and substrates for nanoimprint lithography; Fully automatic machines used for cleaning, coating, developing, etching and stripping of substrates in the nature of semiconductor substrates, hard discs, silicon discs, wafers, photo, hard and embossing masks, templates, structured masks and substrates for nanoimprint lithography; Machines for the semiconductor and hard disc industry, namely, machines for varnishing and coating of substrates, namely, machines for varnishing and coating semiconductor substrates, hard discs, silicon discs, wafers, photo, hard and embossing masks, templates, structured masks and substrates for nanoimprint lithography; Machines for curing coatings and varnishes; machines for cleaning of substrates, in the nature of semiconductor substrates, hard discs, silicon discs, wafers, photo, hard and embossing masks, templates, structured masks and substrates for nanoimprint lithography; Machines used for the manufacture of semiconductors and hard discs; Non-electronic, non-scientific machines for the inspection of substrates and discs; Machines for photo lithographic developing and baking processes for substrates; Machines for etching layers on substrates; Handling and automation components, namely, grippers, transport devices in the nature of 3-link atmospheric robotics, linear axis, storage units; conveyors, loading and unloading machines, linear motions machines for moving objects, pivot motions machines for moving objects; Supply and treatment systems for liquids and gases consisting primarily of stepper motor driven diaphragm pumps, piston pumps, diaphragm pumps, chemical and gas filters, Solenoids and media valves, metering machines

Installation of the machinery and apparatus listed in class 7 to enable the proper execution of the dry chemical and wet chemical as well as physical methods to be run on the system; Cleaning of surfaces of masks used for the production of semiconductors and hard disks; Cleaning of surfaces of semiconductor substrates, hard discs, silicon discs, wafers, photo, hard and embossing masks, templates, structured masks and substrates for nanoimprint lithography by means of dry chemical and wet chemical as well as physical methods; Maintenance of machinery in class 007

Machining and processing of materials, namely, UV light surface preparation of masks used for the production of semiconductors and hard disks; Machining and processing of materials, namely, UV light surface preparation of semiconductor substrates, hard discs, silicon discs, wafers, photo, hard and embossing masks, templates, structured masks and substrates for nanoimprint lithography; Processing of material in the nature of nanoimprint lithographic printing of substrates