VEM - Trademark Details
Status: 800 - Registered And Renewed
Serial Number
77788023
Registration Number
3960351
Word Mark
VEM
Status
800 - Registered And Renewed
Status Date
2021-09-13
Filing Date
2009-07-23
Registration Number
3960351
Registration Date
2011-05-17
Mark Drawing
5000 - Illustration: Drawing with word(s)/letter(s)/number(s) in Stylized form
Typeset
Published for Opposition Date
2011-03-01
Attorney Name
Law Office Assigned Location Code
L80
Employee Name
BEN, LINDSEY HEATHER
Statements
Indication of Colors claimed
Color is not claimed as a feature of the mark.
Description of Mark
The mark consists of the letters "VEM", with a horizontal space separating the top portion of the right side of the "V", the "E" and the "M" from the bottom portion; the top of the "E" extends over the top of the right side of the "V".
Goods and Services
Oxides and carbides in pellets, granules, tablets, flakes, powder, rod, wire and foil format for thin film coating of substrates and substrate materials for use in the fields of semiconductor, compound semiconductor, wireless radio frequency and microwave, precision optics/laser, photovoltaic/solar, emerging display technologies, data storage, micro-electro-mechanical systems, automotive, aerospace/defense, and ophthalmics; discs and sputtering targets made primarily of oxides and carbides bonded with oxides and carbides used in physical vapor deposition chambers and other manufacturing processes for thin film coating of substrates and substrate materials for use in the fields of semiconductor, compound semiconductor, wireless radio frequency and microwave, precision optics/laser, photovoltaic/solar, emerging display technologies, data storage, micro-electro-mechanical systems, automotive, aerospace/defense, and ophthalmics
Goods and Services
Titanium aluminum, tungsten titanium, aluminum silicon, aluminum silicon copper, aluminum copper, gold tin, gold germanium, gold nickel, iron hafnium, iron zirconium, cobalt iron tantalum, nickel chromium silicon, and tungsten silicon alloys, cermets, and refractory compounds, namely, refractory blocks of metal, refractory shapes of metal, fired refractory materials of metal in pellets, granules, tablets, flakes, powder, rod, wire and foil format for thin film coating of substrates and substrate materials for use in the fields of semiconductor, compound semiconductor, wireless radio frequency and microwave, precision optics/laser, photovoltaic/solar, emerging display technologies, data storage, micro-electro-mechanical systems, automotive, aerospace/defense, and ophthalmics; discs and sputtering targets made primarily of metal bonded with titanium aluminum, tungsten titanium, aluminum silicon, aluminum silicon copper, aluminum copper, gold tin, gold germanium, gold nickel, iron hafnium, iron zirconium, cobalt iron tantalum, nickel chromium silicon, and tungsten silicon alloys, cermets, and refractory compounds, namely, refractory blocks of metal, refractory shapes of metal, fired refractory materials of metal used in physical vapor deposition chambers and other manufacturing processes for thin film coating of substrates and substrate materials for use in the fields of semiconductor, compound semiconductor, wireless radio frequency and microwave, precision optics/laser, photovoltaic/solar, emerging display technologies, data storage, micro-electro-mechanical systems, automotive, aerospace/defense, and ophthalmics; Precious and semi-precious metals in pellets, granules, tablets, flakes, powder, rod, wire and foil format for thin film coating of substrates and substrate materials for use in the fields of semiconductor, compound semiconductor, wireless radio frequency and microwave, precision optics/laser, photovoltaic/solar, emerging display technologies, data storage, micro-electro-mechanical systems, automotive, aerospace/defense, and ophthalmics; discs and sputtering targets made primarily of precious and semi-precious metals bonded with precious and semi-precious metals used in physical vapor deposition chambers and other manufacturing processes for thin film coating of substrates and substrate materials for use in the fields of semiconductor, compound semiconductor, wireless radio frequency and microwave, precision optics/laser, photovoltaic/solar, emerging display technologies, data storage, micro-electro-mechanical systems, automotive, aerospace/defense, and ophthalmics
Classification Information
International Class
001 - Chemicals used in industry, science and photography, as well as in agriculture, horticulture and forestry; unprocessed artificial resins, unprocessed plastics; manures; fire extinguishing compositions; tempering and soldering preparations; chemical substances for preserving foodstuffs; tanning substances; adhesives used in industry. - Chemicals used in industry, science and photography, as well as in agriculture, horticulture and forestry; unprocessed artificial resins, unprocessed plastics; manures; fire extinguishing compositions; tempering and soldering preparations; chemical substances for preserving foodstuffs; tanning substances; adhesives used in industry.
US Class Codes
001, 005, 006, 010, 026, 046
Class Status Code
6 - Active
Class Status Date
2010-05-01
Primary Code
001
First Use Anywhere Date
1988-02-29
First Use In Commerce Date
1988-02-29
International Class
006 - Common metals and their alloys; metal building materials; transportable buildings of metal; materials of metal for railway tracks; non-electric cables and wires of common metal; ironmongery, small items of metal hardware; pipes and tubes of metal; safes; goods of common metal not included in other classes; ores. - Common metals and their alloys; metal building materials; transportable buildings of metal; materials of metal for railway tracks; non-electric cables and wires of common metal; ironmongery, small items of metal hardware; pipes and tubes of metal; safes; goods of common metal not included in other classes; ores.
US Class Codes
002, 012, 013, 014, 023, 025, 050
Class Status Code
6 - Active
Class Status Date
2009-07-27
Primary Code
006
First Use Anywhere Date
1988-02-29
First Use In Commerce Date
1988-02-29
Current Trademark Owners
Party Name
Party Type
30 - Original Registrant
Legal Entity Type
03 - Corporation
Address
Please log in with your Justia account to see this address.
Trademark Owner History
Party Name
Party Type
30 - Original Registrant
Legal Entity Type
03 - Corporation
Address
Please log in with your Justia account to see this address.
Party Name
Party Type
20 - Owner at Publication
Legal Entity Type
03 - Corporation
Address
Please log in with your Justia account to see this address.
Party Name
Party Type
10 - Original Applicant
Legal Entity Type
03 - Corporation
Address
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Correspondences
Name
Grace Han Stanton
Address
Please log in with your Justia account to see this address.
Trademark Events
| Event Date | Event Description |
| 2009-07-27 | NEW APPLICATION ENTERED IN TRAM |
| 2009-07-27 | NEW APPLICATION OFFICE SUPPLIED DATA ENTERED IN TRAM |
| 2009-07-28 | NOTICE OF PSEUDO MARK MAILED |
| 2009-10-26 | ASSIGNED TO EXAMINER |
| 2009-10-30 | NON-FINAL ACTION WRITTEN |
| 2009-10-30 | NON-FINAL ACTION E-MAILED |
| 2009-10-30 | NOTIFICATION OF NON-FINAL ACTION E-MAILED |
| 2010-01-06 | ASSIGNED TO EXAMINER |
| 2010-04-30 | TEAS RESPONSE TO OFFICE ACTION RECEIVED |
| 2010-04-30 | CORRESPONDENCE RECEIVED IN LAW OFFICE |
| 2010-05-01 | TEAS/EMAIL CORRESPONDENCE ENTERED |
| 2010-05-21 | NON-FINAL ACTION WRITTEN |
| 2010-05-21 | NON-FINAL ACTION E-MAILED |
| 2010-05-21 | NOTIFICATION OF NON-FINAL ACTION E-MAILED |
| 2010-05-24 | NON-FINAL ACTION WRITTEN |
| 2010-05-24 | NON-FINAL ACTION E-MAILED |
| 2010-05-24 | NOTIFICATION OF NON-FINAL ACTION E-MAILED |
| 2010-11-24 | TEAS RESPONSE TO OFFICE ACTION RECEIVED |
| 2010-11-24 | CORRESPONDENCE RECEIVED IN LAW OFFICE |
| 2010-11-24 | TEAS/EMAIL CORRESPONDENCE ENTERED |
| 2010-12-16 | APPROVED FOR PUB - PRINCIPAL REGISTER |
| 2011-01-12 | ASSIGNED TO LIE |
| 2011-01-13 | LAW OFFICE PUBLICATION REVIEW COMPLETED |
| 2011-01-21 | WITHDRAWN FROM PUB - OG REVIEW QUERY |
| 2011-01-24 | PREVIOUS ALLOWANCE COUNT WITHDRAWN |
| 2011-01-24 | EXAMINERS AMENDMENT -WRITTEN |
| 2011-01-24 | EXAMINERS AMENDMENT E-MAILED |
| 2011-01-24 | NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED |
| 2011-01-24 | EXAMINER'S AMENDMENT ENTERED |
| 2011-01-24 | APPROVED FOR PUB - PRINCIPAL REGISTER |
| 2011-01-26 | LAW OFFICE PUBLICATION REVIEW COMPLETED |
| 2011-03-01 | PUBLISHED FOR OPPOSITION |
| 2011-03-01 | OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED |
| 2011-05-17 | REGISTERED-PRINCIPAL REGISTER |
| 2017-11-17 | TEAS SECTION 8 & 15 RECEIVED |
| 2017-12-13 | CASE ASSIGNED TO POST REGISTRATION PARALEGAL |
| 2017-12-13 | REGISTERED - SEC. 8 (6-YR) ACCEPTED & SEC. 15 ACK. |
| 2017-12-13 | NOTICE OF ACCEPTANCE OF SEC. 8 & 15 - E-MAILED |
| 2020-05-17 | COURTESY REMINDER - SEC. 8 (10-YR)/SEC. 9 E-MAILED |
| 2021-05-12 | TEAS SECTION 8 & 9 RECEIVED |
| 2021-09-13 | CASE ASSIGNED TO POST REGISTRATION PARALEGAL |
| 2021-09-13 | REGISTERED - SEC. 8 (10-YR) ACCEPTED/SEC. 9 GRANTED |
| 2021-09-13 | REGISTERED AND RENEWED (FIRST RENEWAL - 10 YRS) |
| 2021-09-13 | NOTICE OF ACCEPTANCE OF SEC. 8 & 9 - E-MAILED |
