lithographic and implanting machines for producing images, and printing or implanting images on wafers and other substrates, and for heat treating, cleaning, etching, implanting and leveling machines for semiconductor applications; electron-beam columns and systems; reticles and masks for use with said lithographic and implanting machines and electron-beam columns and systems in manufacturing said semiconductor wafers and other substrates, wherein said reticles and masks contain the pattern to be printed on, or implanted in, said semiconductor wafer and other substrates; specialized optical lenses, wafer, reticle and mask transport stages and wafer index tooling for use in manufacturing semiconductor wafers and other substrates; computer software for use in operating lithographic and implanting machines and electron-beam columns and systems for manufacturing semiconductor wafers and other substrates; and replacement parts and consumable materials for the aforesaid goods